Effect of Ti Sputtering Power on Structures and Corrosion Resistance of Titanium Doped Diamond-Like Carbon Nanocomposite Thin FilmsPages 321-332
Nay Win Khun Abstract:
A DC magnetron sputtering deposition system was used to produce titanium-doped diamond-like carbon nanocomposite (Ti-DLCNC) thin films on silicon (Si) substrates. The Ti sputtering power was changed from 20 to 100 W to investigate the effect of Ti content on their chemical compositions, structures, surface roughness, and corrosion resistance. With increased Ti sputtering power, their surface Ti and O contents increased, while their sp2 contents increased via their increased metal-induced graphitization. They had the highest surface roughness, with the biggest asperities protruding above their surfaces at 100 W, resulting from the graphitic phases and Ti aggregates. Their corrosion resistance in a 1 M HCl solution decreased with an increased Ti sputtering power to 60 W as a result of their degraded sp3-bonded cross-linking structures caused by their promoted graphitization and Ti aggregation, but no longer decreased with further increased Ti sputtering power to 100 W due to the formation of passive Ti oxide layers on surface Ti aggregates. It could be concluded that the Ti-DLCNC thin films had the highest content of Ti elements and sp2 bonds and the highest surface roughness at 100 W, but the lowest corrosion resistance at 60 W. Keywords: DLC,
Ti doping,
Chemical composition,
Structure,
Corrosion
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